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Neuromorphic hardware promises to revolutionize information technology with brain-inspired parallel processing, in-memory computing, and energy-efficient implementation of artificial intelligence and machine learning. In particular, two-dimensional (2D) memtransistors enable gate-tunable non-volatile memory, bio-realistic synaptic phenomena, and atomically thin scaling. However, previously reported 2D memtransistors have not achieved low operating voltages without compromising gate-tunability. Here, we overcome this limitation by demonstrating MoS2 memtransistors with short channel lengths < 400 nm, low operating voltages < 1 V, and high field-effect switching ratios > 10,000 while concurrently achieving strong memristive responses. This functionality is realized by fabricating back-gated memtransistors using highly polycrystalline monolayer MoS2 channels on high-κ Al2O3 dielectric layers. Finite-element simulations confirm enhanced electrostatic modulation near the channel contacts, which reduces operating voltages without compromising memristive or field-effect switching. Overall, this work demonstrates a pathway for reducing the size and power consumption of 2D memtransistors as is required for ultrahigh-density integration.